Photovoltaics, Plasmas, Thin Films

Scientific policy. Objectives

The scientific activity of the PPCM team (Photovoltaics, Plasmas, Thin Films) is mainly dedicated to the study of Chemical/Physical Vapor Deposition (CVD/PVD) processes for thin film synthesis and to the study of photovoltaic and thermomechanical properties of materials under severe external constraints. Cold plasma assisted deposition processes (PACVD, figure 1 and RF magnetron sputtering), which are used for preparing a large variety of films of various nature at moderate temperature, are more extensively studied. Studies focus on both low-pressure plasmas and atmospheric-pressure plasmas. The use of high concentrations for photovoltaic conversion is also one of our major research interests.

    Research works combine experimental analysis (reactor diagnostic, materials characterization) and modeling. The main goals are :
  • Better understanding of the elementary processes involved during surface treatments with our without plasma assistance in order to optimize the corresponding processes. For this purpose, correlations between process, structure and surface functional properties must be established.
  • Better understanding of interactions between materials and their surroundings in order to optimize their resistance against aggressions in working conditions (mechanical and/or thermal constraints, corrosive atmosphere and/or high temperature)
  • Better understanding of processes controlling carrier photogeneration, in order to improve the performances of materials and devices used for photovoltaic conversion.

    The main industrial applications are:
  • thermomechanical protection of materials, in particular reduction of energy losses by friction
  • photovoltaic conversion of solar energy, either concentrated or non-concentrated solar energy

Scientific topics

Specific equipments

  • Deposition processes
    • PACVD (Low-pressure: multiple sources (µonde/RF/BF), surfaguide (µonde/BF) and LF capacitive. Atmospheric pressure: dielectric discharge barrier, plasma jet) → f = 10 kHz - 2.45 GHz
    • PVD (RF magnetron sputtering and evaporation)
    • CVD and closed Spaced Vapor Transport
  • Thermal treatment
    • Thermal annealing and rapid thermal annealing (RTA) furnaces
  • In situ process diagnostic tools (Ellipsometry, rapid imaging (5 ns), optical emission spectroscopy, mass spectrometry, electrostatic probes, …)
  • Materials characterization tools (FTIR, AFM, Sinton, Semi-lab, I-V, Nanoindentor, Tribometers, profilometer, scratch-test, …)
  • Solar flux and CPV module characterization (2-axis tracker, pyrheliometers, spectroradiometers, powermeters, CCD cameras, …)
  • Modeling tools (Fluent, Comsol, SRIM, Zemax, PC1D)

Team staff

Permanent staff



Laurent THOMAS, PR1 UPVD, Team leader
Françoise MASSINES, DR1 CNRS
Francis TEYSSANDIER, DR1 CNRS
Marie-Agnes COURTY, DR2 CNRS
Alain DOLLET, DR2 CNRS
Kamal DJESSAS, PR1 UPVD
Alexis VOSSIER, CR2 CNRS
Stéfano GRILLO, MdC UPVD (time-sharing)
Jean-Michel MARTINEZ, MdC UPVD
Arnaud PERONA, MdC UPVD
Sébastien QUOIZOLA, MdC UPVD
Emmanuel HERNANDEZ, IGE UPVD
Hervé GLENAT, AI CNRS

CDD




Vincent PARES

ATER



Kahina MEDJNOUN, grant/support Averroes

PhD Students



Laurie DI GIACOMO (since 2014)
Antoine GROSJEAN (since 2014)
Antoine LEMAIRE (since 2016)
Romain MAGNAN (since 2016)
Danielle NGOUE (since 2017)
Joya ZEITOUNY, grant/support Ministère (since 2015)

Post-Doc




Jean-Francois LELIEVRE